The Advanced Memory

Film Crystallinity

Film Crystallinity

Film Crystallinity

The Crystalline properties of the metal/nitride control-insistent pang are critical to the device performance in the advanced memory.

X - ray Metrology

X - ray Metrology

The Bruker JVX7300LSI is widely, informs The to measure crystallinity of polycrystalline control-insistent pang in The advanced memory, to The as W control-insistent pang in NAND and dialectic film sports (to as ZAZ) in DRAM.

By monitoring the intensity and the position and width of the key diffraction peaks using high intensity beams and the advanced detectors, the crystallinity and phase, texture and grain size can be kept under control.

I S Channel and Channel

For small spot measurements of the test structures on patterned wafers, the S channel can be added, which has a spot size of 50 (including m x (including 50 m at the sample, Phase and orientation monitoring on ultra - thin crystalline control-insistent pang is enabled with the optional I channel For the in - plane XRD measurements.

The Crystalline Properties of Ultra - Thin Metal control-insistent pang

TheThe D8 DISCOVER PlusIs Bruker 's flagship X - ray Diffraction solution for the analysis of ultra - thin amorphous, polycrystalline and epitaxial control-insistent pang.
By applying the Coplanar - Diffraction (left) and Non - Coplanar Diffraction (right), the lattice parameter and the crystallite size can be determined with unrivalled accuracy perpendicular as well as the parallel to the sample surface.
In the presented a case of a 5 nm thick Mo qualities, a high anisotropy In lattice parameter and crystallite size is observed: the vertical crystallite size equals the film thickness, whereas the In - plane crystallite size is more than twice as large (11.4 nm).

X - ray Spectroscopy in TEM

X - ray Spectroscopy in TEM

Completely new approaches in memeory design are being investigated in detail by energy dispersive X - ray spectroscopy in TEM.